Reactive ion etching of gallium nitride in silicon tetrachloride plasmasa)

I. Adesida, A. Mahajan, E. Andideh, +3

Applied Physics Letters

Influence of phonon, geometry, impurity, and grain size on Copper line resistivity

John J. Plombon, E. Andideh, Valery M. Dubin, +1

Applied Physics Letters

EngineeringSubmicron Copper LinesElectron DiffractionGrain SizeNarrowest Line +17

Interfacial adhesion of copper-low k interconnects

E. Andideh, T. Scherban, Benyuan Sun, +3

EngineeringMechanical EngineeringInterfacial AdhesionAdhesion EnergiesInterconnect (Integrated Circuits) +14

Compositional effects on electrical and mechanical properties in carbon-doped oxide dielectric films: Application of Fourier-transform infrared spectroscopy

E. Andideh, Michael M. Lerner, Gerald Palmrose, +4

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

EngineeringGlass MaterialInterlayer DielectricsThin Film Process TechnologyChemistry +19

Nanostructure fabrication in InP and related compounds

I. Adesida, K. Nummila, E. Andideh, +4

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

EngineeringElectron-beam LithographyMaterial InnovationChemical EngineeringNanoscale Chemistry +18

High precision temperature- and energy-dependent refractive index of GaAs determined from excitation of optical waveguide eigenmodes

Scott Kisting, Paul W. Bohn, E. Andideh, +4

Applied Physics Letters

Optical MaterialsEngineeringOptical Transmission SystemOptical TestingGaas-al0.22ga0.78as Heterostructure +15

Transient enhanced diffusion after laser thermal processing of ion implanted silicon

K. S. Jones, Heather Banisaukas, Josh Glassberg, +5

Applied Physics Letters

Materials ScienceEnhanced DiffusionIon ImplantationEngineeringCrystalline Defects +10

Optical pump and probe measurement of the thermal conductivity of low-<i>k</i> dielectric thin films

Brian C. Daly, Humphrey J. Maris, W. K. Ford, +3

Journal of Applied Physics

Thin Film PhysicsOptical MaterialsProbe MeasurementEngineeringThin Film Process Technology +22

Characterization of GaAs/Al<i>x</i>Ga1−<i>x</i>As selective reactive ion etching in SiCl4/SiF4 plasmas

W. H. Guggina, A. Ketterson, E. Andideh, +4

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Materials ScienceSelective Reactive IonElectrical EngineeringAuger Electron SpectroscopyEngineering +12

Short-period gratings for long-wavelength optical devices

E. Andideh, I. Adesida, T. Brock, +2

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena

Transient GratingOptical MaterialsEngineeringElectron-beam LithographyChemistry +16