Arul Vigneswar Ravichandran

Author

Also Known As

Antonio T. Lucero, Arul Ravichandran, Arul V. Ravichandran, Arul Vigneswar Ravichandran

Publications

139

Citations

H-Index

Concepts

All Affiliations

Arul Vigneswar Ravichandran is an author at The University of Texas at Dallas specializing in applied physics, engineering, and thin films.

#	Concept	H-Index	Publications	Citations
1	Engineering	3	3	36
2	Applied Physics	3	3	36
3	Chemical Engineering	1	1	14
4	Chemistry	1	1	12
5	Electrical Engineering	1	1	10

Arul Vigneswar Ravichandran

Publications

108

Citations

H-Index

Page 1

	Year	Citations
Sub-10 nm Tunable Hybrid Dielectric Engineering on MoS<sub>2</sub> for Two-Dimensional Material-Based Devices Lanxia Cheng, Jaebeom Lee, Hui Zhu, ACS Nano	2017	37
Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics Jaebeom Lee, Arul Vigneswar Ravichandran, Jaidah Mohan, ACS Applied Materials & Interfaces	2020	35
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiN<i><sub>x</sub></i> Films Using Trichlorodisilane for Etch-Resistant Coatings Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, ACS Applied Nano Materials Etch-resistant CoatingsEngineeringChemical DepositionPlasma ProcessingSurface Technology	2021	14
High growth rate and high wet etch resistance silicon nitride grown by low temperature plasma enhanced atomic layer deposition with a novel silylamine precursor Harrison Sejoon Kim, Su Min Hwang, Xin Meng, Journal of Materials Chemistry C Materials ScienceAld ProcessEngineeringHigh Growth RateSurface Science	2020	12
Robust SiN<sub>x</sub>/GaN MIS-HEMTs With Crystalline Interfacial Layer Using Hollow Cathode PEALD Xin Meng, Jaebeom Lee, Arul Vigneswar Ravichandran, IEEE Electron Device Letters SemiconductorsWide-bandgap SemiconductorElectrical EngineeringElectronic DevicesEngineering	2018	10

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