Jaebeom Lee - Concepedia

Author

Jaebeom Lee

The University of Texas at Dallas ORCID

Also Known As

J. Lee, Jae-Beom Lee, Jaebeom Lee

Publications

717

Citations

H-Index

Concepts

All Affiliations

The University of Texas at Dallas Texas Instruments (United States)Kangwon National University Seoul National University Kookmin University

About

Jaebeom Lee is an author at The University of Texas at Dallas specializing in engineering, thin films, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	603
2	Applied Physics	6	6	511
3	Chemical Engineering	2	2	48
4	Chemistry	1	1	34
5	Computer Engineering	1	1	13

Jaebeom Lee

Publications

707

Citations

H-Index

Page 1

	Year	Citations
Large ferroelectric polarization of TiN/Hf0.5Zr0.5O2/TiN capacitors due to stress-induced crystallization at low thermal budget Si Joon Kim, Dushyant Narayan, Jae‐Gil Lee, Applied Physics Letters EngineeringLow Thermal BudgetStress-induced CrystallizationAtomic LayerFerroelectric Application	2017	286
Effect of film thickness on the ferroelectric and dielectric properties of low-temperature (400 °C) Hf0.5Zr0.5O2 films Si Joon Kim, Jaidah Mohan, Jaebeom Lee, Applied Physics Letters Materials ScienceDielectric PropertiesEngineeringFerroelectric ApplicationFilm Thickness	2018	155
Low-voltage operation and high endurance of 5-nm ferroelectric Hf0.5Zr0.5O2 capacitors Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, Applied Physics Letters Materials ScienceMaterials EngineeringElectrical EngineeringMagnetic PropertiesEngineering	2018	79
Sub-10 nm Tunable Hybrid Dielectric Engineering on MoS<sub>2</sub> for Two-Dimensional Material-Based Devices Lanxia Cheng, Jaebeom Lee, Hui Zhu, ACS Nano	2017	37
Atomic Layer Deposition of Layered Boron Nitride for Large-Area 2D Electronics Jaebeom Lee, Arul Vigneswar Ravichandran, Jaidah Mohan, ACS Applied Materials & Interfaces	2020	35
Effect of hydrogen derived from oxygen source on low-temperature ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, Applied Physics Letters Oxygen SourceEngineeringFe Hzo FilmsChemistryHydrogen Generation	2019	34
Stress-Induced Crystallization of Thin Hf<sub>1–<i>X</i></sub>Zr<sub><i>X</i></sub>O<sub>2</sub> Films: The Origin of Enhanced Energy Density with Minimized Energy Loss for Lead-Free Electrostatic Energy Storage Applications Si Joon Kim, Jaidah Mohan, Joy S. Lee, ACS Applied Materials & Interfaces	2019	32
Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiN<i><sub>x</sub></i> Films Using Trichlorodisilane for Etch-Resistant Coatings Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, ACS Applied Nano Materials Etch-resistant CoatingsEngineeringChemical DepositionPlasma ProcessingSurface Technology	2021	14
Application-Support Particle Filter for Dynamic Voltage Scaling of Multimedia Applications Jaebeom Lee, Myoung‐Jin Kim, Sungroh Yoon, IEEE Transactions on Computers Dynamic VoltageEngineeringVideo Coding FormatVideo ProcessingVideo Quality	2011	13
Low Temperature (400&#x000B0;c) Ferroelectric Hf0.5Zr0.5O2 Capacitors for Next-Generation FRAM Applications Si Joon Kim, Dushyant Narayan, Jae‐Gil Lee, Materials ScienceElectrical EngineeringMaterial AnalysisEngineeringFerroelastics	2017	12

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