A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films

Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, +11

Materials

Investigation of the Physical Properties of Plasma Enhanced Atomic Layer Deposited Silicon Nitride as Etch Stopper

Harrison Sejoon Kim, Xin Meng, Si Joon Kim, +12

ACS Applied Materials & Interfaces

Effect of hydrogen derived from oxygen source on low-temperature ferroelectric TiN/Hf0.5Zr0.5O2/TiN capacitors

Si Joon Kim, Jaidah Mohan, Harrison Sejoon Kim, +12

Applied Physics Letters

Oxygen SourceEngineeringFe Hzo FilmsChemistryHydrogen Generation +18

Hollow Cathode Plasma-Enhanced Atomic Layer Deposition of Silicon Nitride Using Pentachlorodisilane

Xin Meng, Harrison Sejoon Kim, Antonio T. Lucero, +8

ACS Applied Materials & Interfaces

Low Temperature Thermal Atomic Layer Deposition of Aluminum Nitride Using Hydrazine as the Nitrogen Source

Yong Chan Jung, Su Min Hwang, Dan N. Le, +4

Materials

Atomic layer deposition and its derivatives for extreme ultraviolet (EUV) photoresist applications

Dan N. Le, Taehee Park, Su Min Hwang, +9

Japanese Journal of Applied Physics

Optical MaterialsEngineeringElectron-beam LithographyPhotolithography WavelengthOptoelectronic Devices +21

Susceptibility and Coupled Waveform of Microcontroller Device by Impact of UWB-HPEM

Su Min Hwang, J. I. Hong, Seung Moon Han, +2

Journal of Electromagnetic Waves and Applications

Electrical EngineeringEngineeringRadio FrequencyHigh-frequency DeviceUltra-wideband Communication +8

Inductively Coupled Plasma Reactive Ion Etching of Magnetic Tunnel Junction Stacks in a CH3COOH/Ar Gas

Adrian Adalberto Garay, Ji Hyun Choi, Su Min Hwang, +1

ECS Solid State Letters

MagnetismElectrical EngineeringEngineeringTunneling MicroscopyPhysics +11

Plasma-Enhanced Atomic-Layer Deposition of Nanometer-Thick SiN<i>_x</i> Films Using Trichlorodisilane for Etch-Resistant Coatings

Su Min Hwang, Harrison Sejoon Kim, Dan N. Le, +10

ACS Applied Nano Materials

Etch-resistant CoatingsEngineeringChemical DepositionPlasma ProcessingSurface Technology +16

Susceptibility of Microcontroller Devices due to Coupling Effects Under Narrow-Band High Power Electromagnetic Waves by Magnetron

J. I. Hong, Su Min Hwang, Chul Huh

Journal of Electromagnetic Waves and Applications

EngineeringDestruction CharacteristicsRadio FrequencyMicrowave TransmissionMicrocontroller Devices +19