Amit Khandelwal

Manufacturable Processes for $\leq$ 32-nm-node CMOS Enhancement by Synchronous Optimization of Strain-Engineered Channel and External Parasitic Resistances

Atif Noori, Mihaela Balseanu, Pieter Boelen et al. · IEEE Transactions on Electron Devices · 2008 · 39 citations

Engineering, Computer Engineering, Electrical Engineering +17

Reaction pathways in remote plasma nitridation of ultrathin SiO2 films

Hiro Niimi, Amit Khandelwal, H. Henry Lamb et al. · Journal of Applied Physics · 2002 · 38 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +16

Low-temperature Ar/N2 remote plasma nitridation of SiO2 thin films

Amit Khandelwal, Hiro Niimi, G. Lucovsky et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2002 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ar/N 2 O remote plasma-assisted oxidation of Si(100): Plasma chemistry, growth kinetics, and interfacial reactions

Bradley C. Smith, Amit Khandelwal, H. Henry Lamb · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2000 · 17 citations

Natural Sciences, Materials Science, Physics +17

Nitrogen incorporation in ultrathin gate dielectrics: A comparison of He/N2O and He/N2 remote plasma processes

Amit Khandelwal, Bradley C. Smith, H. Henry Lamb · Journal of Applied Physics · 2001 · 17 citations

Natural Sciences, Materials Engineering, Materials Science +17