Peter Van Buskirk

MOCVD of BaSrTiO₃ for ulsi drams

Peter S. Kirlin, Steve Bilodeau, Peter Van Buskirk · Integrated ferroelectrics · 1995 · 56 citations

Materials Science, Materials Engineering, Source Reagents +12

Demonstration of scaled (⩾0.12 μm2) Pb(Zr,Ti)O3 capacitors on W plugs with Al interconnect

Scott R. Summerfelt, T. S. Moise, Guoqiang Xing et al. · Applied Physics Letters · 2001 · 39 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Properties of SrBi₂Ta₂O₉ thin films grown by MOCVD for high density FeRAM applications

Frank Hintermaier, B. C. Hendrix, Debra A. Desrochers et al. · Integrated ferroelectrics · 1998 · 18 citations

Materials Engineering, Materials Science, Oxide Heterostructures +13

Atomic layer deposition of CeO2 using a heteroleptic cyclopentadienyl-amidinate precursor

Maryam Golalikhani, Trevor E. James, Peter Van Buskirk et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2018 · 16 citations · Full text

Materials Science, Transition Metal Chalcogenides, Applied Chemistry +15

Single molecular precursor metal-organic chemical vapor deposition of MgAl₂O₄ thin films

Jiming Zhang, Gregory T. Stauf, Robin Gardiner et al. · Journal of materials research/Pratt's guide to venture capital sources · 1994 · 15 citations

Materials Science, Engineering, Surface Science +6