Concepedia

C. Marcadal

CM

Statistics

Publications

5

Citations

112

H-Index

5

Active since

1997

Affiliations

Applied Materials (United States)(Current)

Technion – Israel Institute of Technology

Commissariat à l'Énergie Atomique et aux Énergies Alternatives

C. Marcadal is an author at Applied Materials (United States) specializing in materials engineering, electronic materials, and barrier materials.

Publications per year

1997–2002

5

Publications

5

Plasma induced microstructural, compositional, and resistivity changes in ultrathin chemical vapor deposited titanium nitride films

Roland Kröger, M. Eizenberg, C. Marcadal et al. · Journal of Applied Physics · 2002 · 50 citations

Natural Sciences, Materials Engineering, Materials Science +17

Metallorganic Chemical Vapor Deposited TiN Barrier Enhancement with SiH[sub 4] Treatment

C. Marcadal, M. Eizenberg, Alex Yoon et al. · Journal of The Electrochemical Society · 2002 · 22 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ultra thin diffusion barriers for Cu interconnections at the gigabit generation and beyond

Flavie Braud, J. Torrès, J. Palleeau et al. · Microelectronic Engineering · 1997 · 17 citations

Engineering, Electrical Engineering, Materials Engineering +16

TiSiN films produced by chemical vapor deposition as diffusion barriers for Cu metallization

Sudha Joseph, M. Eizenberg, C. Marcadal et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2002 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +17

CVD process for copper interconnection

C. Marcadal, E. Richard, J. Torrès et al. · Microelectronic Engineering · 1997 · 11 citations

Engineering, Manufacturing Engineering, Materials Engineering +11

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