P.-E. Hallali

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Active since

1990

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

P.-E. Hallali is an author at IBM Research - Thomas J. Watson Research Center specializing in engineering, electronic materials, and semiconductor materials.

Publications per year

1990–1991

Publications

Thermally stable ohmic contacts to <i>n</i>-type GaAs. VII. Addition of Ge or Si to NiInW ohmic contacts

Masanori Murakami, W. H. Price, M. Norcott et al. · Journal of Applied Physics · 1990 · 19 citations

Engineering, Electrical Engineering, Materials Science +17

Outdiffusion of Be during rapid thermal annealing of high-dose Be-implanted GaAs

H. Baratte, D. K. Sadana, J. P. de Souza et al. · Journal of Applied Physics · 1990 · 13 citations · Full text

Engineering, Electrical Engineering, Materials Science +17

Thermally stable ohmic contacts to <i>p</i>-type GaAs. IX. NiInW and NiIn(Mn)W contact metals

P.-E. Hallali, Masanori Murakami, W. H. Price et al. · Journal of Applied Physics · 1991 · 12 citations

Engineering, Electrical Engineering, Materials Science +17

High-transconductance p-channel AlGaAs/GaAs HFETs with low-energy beryllium and fluorine co-implantation self-alignment

R.A. Kiehl, P.-E. Hallali, J.R. Yates et al. · IEEE Electron Device Letters · 1991 · 10 citations

Engineering, Electrical Engineering, Materials Engineering +14

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