Bradley Morgenfeld

Ti and NiPt/Ti liner silicide contacts for advanced technologies

Praneet Adusumilli, Emre Alptekin, M. Raymond et al. · 2016 · 31 citations

Engineering, Electrical Engineering, Materials Science +14

Benefits and trade-offs of global source optimization in optical lithography

Kehan Tian, Azalia A. Krasnoperova, David Melville et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 27 citations

Natural Sciences, Computer Engineering, Design Automation +10

Early detection of systematic patterning problems for a 22nm SOI technology using E-beam hot spot inspection

Oliver D. Patterson, Deborah A. Ryan, Mike D. Monkowski et al. · 2013 · 15 citations

Engineering, Computer Engineering, Electrical Engineering +16

Patterned wafer geometry (PWG) metrology for improving process-induced overlay and focus problems

Timothy A. Brunner, Yue Zhou, Cheuk Wun Wong et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2016 · 14 citations

Engineering, Manufacturing Engineering, Materials Science +15

32 nm logic patterning options with immersion lithography

K. Lai, Sean Burns, Scott Halle et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 12 citations

Engineering, Computer Engineering, Electrical Engineering +13