Statistics
Publications
3
Citations
50
H-Index
3
Active since
2016
Affiliations
IBM (United States)(Current)
Koichi Hontake is an author at IBM (United States) specializing in electrical engineering, manufacturing defects, and thin film lithography.
Publications per year
2016–2018
3
3
Driving down defect density in composite EUV patterning film stacks
Luciana Meli, Karen Petrillo, Anuja De Silva et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2017 · 13 citations
Natural Sciences, Electrical Engineering, Manufacturing Engineering +17
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