F. H. Eisen

Principles and applications of ion beam techniques for the analysis of solids and thin films

Wei Chu, J. W. Mayer, M‐A. Nicolet et al. · Thin Solid Films · 1973 · 331 citations

Materials Science, Ion Implantation, Engineering +8

Channeling of medium-mass ions through silicon

F. H. Eisen · Canadian Journal of Physics · 1968 · 208 citations

Ion Implantation, Medium-mass Ions, Nuclear Physics +13

Stopping power of energetic helium ions transmitted through thin silicon crystals in channelling and random directions

F. H. Eisen, G. J. Clark, J. B⊘ttiger et al. · Radiation Effects · 1972 · 148 citations

GaAs/(Ga,Al)As heterojunction bipolar transistors with buried oxygen-implanted isolation layers

P.M. Asbeck, Debra L. Miller, R.J. Anderson et al. · IEEE Electron Device Letters · 1984 · 97 citations

Electrical Engineering, Simple Self-aligned Technique, Engineering +10

Analysis of disorder distributions in boron implanted silicon

J.E. Westmoreland, J. W. Mayer, F. H. Eisen et al. · Radiation Effects · 1970 · 94 citations

Engineering, Ion Beam Instrumentation, Silicon On Insulator +16