Concepedia

D. Cote

DC

Statistics

Publications

4

Citations

158

H-Index

4

Active since

1995

Affiliations

IBM (United States)(Current)

Applied Materials (United States)

D. Cote is an author at IBM (United States) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceThin FilmsSurface ScienceMicroelectronicsElectrical InsulationMaterials EngineeringElectrical EngineeringGeochemistry

Publications per year

1995–1999

4

Publications

4

Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits

D. Cote, S. Nguyen, A. K. Stamper et al. · IBM Journal of Research and Development · 1999 · 96 citations

Materials Science, Materials Engineering, Electrical Engineering +14

Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

D. Cote, S. Nguyen, W. Cote et al. · IBM Journal of Research and Development · 1995 · 39 citations

Dielectric Planarization, Engineering, Multilevel Microelectronic Circuits +16

High Temperature Subatmospheric Chemical Vapor Deposited Undoped Silicate Glass: A Solution for Next Generation Shallow Trench Isolation

Li-Qun Xia, Srinivas Nemani, M. Galiano et al. · Journal of The Electrochemical Society · 1999 · 12 citations

Materials Science, Glass-ceramic, Bond Reconstruction +12

High Aspect Ratio Trench Filling Using Two‐Step Subatmospheric Chemical Vapor Deposited Borophosphosilicate Glass for <0.18 μm Device Application

Li-Qun Xia, R. Conti, M. Galiano et al. · Journal of The Electrochemical Society · 1999 · 11 citations

Thin Film Physics, Engineering, Glass Material +20

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