Concepedia

D. Cote

DC

Statistics

Publications

4

Citations

162

H-Index

4

Active since

1995

Affiliations

IBM (United States)(Current)

Applied Materials (United States)

D. Cote is an author at IBM (United States) specializing in materials science, chemical vapor deposition, and materials engineering.

Publications per year

1995–1999

4

Publications

4

Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits

D. Cote, S. Nguyen, A. K. Stamper et al. · IBM Journal of Research and Development · 1999 · 100 citations

Natural Sciences, Materials Engineering, Materials Science +17

Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM

D. Cote, S. Nguyen, W. Cote et al. · IBM Journal of Research and Development · 1995 · 39 citations

Engineering, Materials Engineering, Materials Science +17

High Temperature Subatmospheric Chemical Vapor Deposited Undoped Silicate Glass: A Solution for Next Generation Shallow Trench Isolation

Li-Qun Xia, Srinivas Nemani, M. Galiano et al. · Journal of The Electrochemical Society · 1999 · 12 citations

Natural Sciences, Materials Engineering, Materials Science +16

High Aspect Ratio Trench Filling Using Two‐Step Subatmospheric Chemical Vapor Deposited Borophosphosilicate Glass for <0.18 μm Device Application

Li-Qun Xia, R. Conti, M. Galiano et al. · Journal of The Electrochemical Society · 1999 · 11 citations

Natural Sciences, Materials Engineering, Materials Science +16

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