O. Humbel

Comparison of WTi and WTi(N) as diffusion barriers for Al and Cu metallization on Si with respect to thermal stability and diffusion behavior of Ti

M. Fugger, Mathias Plappert, C. Schäffer et al. · Microelectronics Reliability · 2014 · 31 citations

Natural Sciences, Materials Engineering, Materials Science +16

A new degree of freedom in diode optimization: arbitrary axial lifetime profiles by means of ion irradiation

P. Hazdra, J. Vobecký, N. Galster et al. · 2002 · 20 citations

Engineering, Electrical Engineering, Microelectronics +11

Crossing point current of electron and proton irradiated power P-i-N diodes

J. Vobecký, P. Hazdra, O. Humbel et al. · Microelectronics Reliability · 2000 · 17 citations

Engineering, Electrical Engineering, Physics +11

4.5 kV-fast-diodes with expanded SOA using a multi-energy proton lifetime control technique

O. Humbel, N. Galster, F. Bauer et al. · 2003 · 12 citations

Engineering, Electrical Engineering, Electronic Materials +8