Concepedia

C. Barratt

CB

Statistics

Publications

13

Citations

632

H-Index

12

Active since

1992

Affiliations

Plasma Processes (United States)(Current)

University of Florida

Sandia National Laboratories

AT&T (United States)

Nokia (United States)

C. Barratt is an author at Plasma Processes (United States) specializing in semiconductor devices, plasma etching, and engineering.

Publications per year

1992–1997

13

Publications

13

Inductively coupled plasma etching of GaN

R. J. Shul, G McClellan, S.A. Casalnuovo et al. · Applied Physics Letters · 1996 · 214 citations

, , +17

High-density plasma etching of compound semiconductors

R. J. Shul, G McClellan, R. D. Briggs et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1997 · 122 citations

, , +17

Comparison of dry etch techniques for GaN

R. J. Shul, G McClellan, S. J. Pearton et al. · Electronics Letters · 1996 · 61 citations

, , +17

Smooth, low-bias plasma etching of InP in microwave Cl2/CH4/H2 mixtures

C. Constantine, C. Barratt, S. J. Pearton et al. · Applied Physics Letters · 1992 · 46 citations

, , +17

Microwave CI <sub>2</sub> /H <sub>2</sub> discharges for high rate etching of InP

C. Constantine, C. Barratt, S. J. Pearton et al. · Electronics Letters · 1992 · 33 citations

, , +17

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