Ryo Hirose

Proximity gettering of C₃H₅ carbon cluster ion-implanted silicon wafers for CMOS image sensors: Gettering effects of transition metal, oxygen, and hydrogen impurities

Kazunari Kurita, Takeshi Kadono, Ryousuke Okuyama et al. · Japanese Journal of Applied Physics · 2016 · 50 citations

Materials Science, Electrical Engineering, New Technique +15

Trapping and diffusion kinetic of hydrogen in carbon-cluster ion-implantation projected range in Czochralski silicon wafers

Ryosuke Okuyama, Ayumi Masada, Takeshi Kadono et al. · Japanese Journal of Applied Physics · 2017 · 36 citations

Ion Implantation, Engineering, Crystalline Defects +15

Crosslinked nanogel-based porous hydrogel as a functional scaffold for tongue muscle regeneration

N. Kinoshita, Yoshihiro Sasaki, Eriko Marukawa et al. · Journal of Biomaterials Science Polymer Edition · 2020 · 27 citations · Full text

Proximity Gettering Design of Hydrocarbon–Molecular–Ion–Implanted Silicon Wafers Using Dark Current Spectroscopy for CMOS Image Sensors

Kazunari Kurita, Takeshi Kadono, Satoshi Shigematsu et al. · Sensors · 2019 · 24 citations · Full text

Materials Science, Electrical Engineering, Electronic Devices +15

Trapping and diffusion behaviour of hydrogen simulated with TCAD in projection range of carbon‐cluster implanted silicon epitaxial wafers for CMOS image sensors

Ryosuke Okuyama, Satoshi Shigematsu, Ryo Hirose et al. · Physica status solidi. C, Conferences and critical reviews/Physica status solidi. C, Current topics in solid state physics · 2017 · 19 citations

Semiconductor Technology, Electrical Engineering, Engineering +13