Tailoring the dielectric properties of HfO2–Ta2O5 nanolaminates

Kaupo Kukli, Jarkko Ihanus, Mikko Ritala, +1

Applied Physics Letters

Materials ScienceDielectric PropertiesElectrical EngineeringMaterial AnalysisEngineering +13

Properties of Ta2 O 5‐Based Dielectric Nanolaminates Deposited by Atomic Layer Epitaxy

Kaupo Kukli, Jarkko Ihanus, Mikko Ritala, +1

Journal of The Electrochemical Society

EngineeringAtomic Layer EpitaxyTa2 OThin Film Process TechnologyMolecular Beam Epitaxy +19

AFM studies on ZnS thin films grown by atomic layer epitaxy

Jarkko Ihanus, Mikko Ritala, Markku Leskelä, +4

Applied Surface Science

Materials ScienceIi-vi SemiconductorEpitaxial GrowthEngineeringAtomic Layer Epitaxy +7

Growth of strongly orientated lead sulfide thin films by successive ionic layer adsorption and reaction (SILAR) technique

Tapio Kanniainen, Seppo Lindroos, Jarkko Ihanus, +1

Journal of Materials Chemistry

EngineeringSolid-state ChemistrySoda Lime GlassChemistryChemical Deposition +15

Properties of [Mg₂(thd)₄] as a Precursor for Atomic Layer Deposition of MgO Thin Films and Crystal Structures of [Mg₂(thd)₄] and [Mg(thd)₂(EtOH)₂]

Timo Hatanpää, Jarkko Ihanus, J. Kansikas, +3

Chemistry of Materials

EngineeringThin Film Process TechnologyChemistryChemical DepositionInorganic Compound +17

Atomic Layer Deposition of SrS and BaS Thin Films Using Cyclopentadienyl Precursors

Jarkko Ihanus, Timo S. Hänninen, Timo Hatanpää, +6

Chemistry of Materials

EngineeringCrystal Growth TechnologyThin Film Process TechnologyChemical DepositionBas Thin Films +15

Growth of lead selenide thin films by the successive ionic layer adsorption and reaction (SILAR) technique

Tapio Kanniainen, Seppo Lindroos, Jarkko Ihanus, +1

Journal of Materials Chemistry

Materials ScienceMaterials EngineeringChemical EngineeringEngineeringSurface Chemistry +13

ALE growth of ZnS1−xSex thin films by substituting surface sulfur with elemental selenium

Jarkko Ihanus, Mikko Ritala, Markku Leskelä, +1

Applied Surface Science

Materials ScienceIi-vi SemiconductorEngineeringNanotechnologyCrystal Growth Technology +9

Atomic Layer Deposition and Characterization of Aluminum Silicate Thin Films for Optical Applications

Jani Hämäläinen, Jarkko Ihanus, Timo Sajavaara, +2

Journal of The Electrochemical Society

Optical MaterialsEngineeringOptical CoatingsThin Film Process TechnologyChemical Deposition +15

Aging of electroluminescent ZnS:Mn thin films deposited by atomic layer deposition processes

Jarkko Ihanus, Mikko P. Lankinen, Marianna Kemell, +2

Journal of Applied Physics

EngineeringOptoelectronic DevicesThin Film Process TechnologySemiconductorsIi-vi Semiconductor +15