Effect of fluorine on boron diffusion in thin silicon dioxides and oxynitride

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro, +4

Journal of Applied Physics

EngineeringThin Silicon DioxidesChemistrySilicon On InsulatorBorophene +14

Boron Diffusion Through Pure Silicon Oxide and Oxynitride Used for Metal‐Oxide‐Semiconductor Devices

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro, +4

Journal of The Electrochemical Society

SemiconductorsMaterials ScienceElectrical EngineeringBoron DiffusionPure Silicon Oxide +10

Diffusion of Boron, Phosphorus, Arsenic, and Antimony in Thermally Grown Silicon Dioxide

Takayuki Aoyama, Hiroko Tashiro, Kunihiro Suzuki

Journal of The Electrochemical Society

Materials EngineeringChemical EngineeringIon ImplantationEngineeringDopant Impurities +13

Structural Analysis of Ag–In–Sb–Te Phase-Change Material

Hiroko Tashiro, Makoto Harigaya, Yoshiyuki Kageyama, +7

Japanese Journal of Applied Physics

Optical MaterialsEngineeringSolid-state ChemistryMaterial SystemOptical Properties +16

Flatband voltage shift in PMOS devices caused by carrier activation in p+-polycrystalline silicon and by boron penetration

Takayuki Aoyama, Ken Suzuki, Hiroko Tashiro, +3

IEEE Transactions on Electron Devices

Electrical EngineeringEngineeringNanoelectronicsGrain SizeBias Temperature Instability +9

High activity of B during solid-phase epitaxy in a pre-amorphized layer formed by Ge ion implantation and deactivation during a subsequent thermal process

Ken Suzuki, Hiroko Tashiro, Koziro Narita, +1

IEEE Transactions on Electron Devices

Materials ScienceIon ImplantationSolid SolubilityEngineeringEpitaxial Growth +13

Nitrogen Concentration Dependence on Boron Diffusion in Thin Silicon Oxynitrides Used for Metal‐Oxide‐Semiconductor Devices

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro, +2

Journal of The Electrochemical Society

SemiconductorsMaterials ScienceElectrical EngineeringChemical EngineeringBoron Diffusion +11

Diffusion coefficient of indium in Si substrates and analytical redistribution profile model

Kunihiro Suzuki, Hiroko Tashiro, Takayuki Aoyama

Solid-State Electronics

Electrical EngineeringEngineeringDiffusion ResistanceSi SubstratesDiffusion Coefficient +7

CMOS-SRAM soft-error simulation system

Shuichi Satoh, R. Sudo, Hiroko Tashiro, +3

Electrical EngineeringEngineeringVlsi DesignBias Temperature InstabilityComputer Engineering +7

CMOS-SRAM soft-error simulation system

Shuichi Satoh, R. Sude, Hiroko Tashiro, +2

Electrical EngineeringEngineeringVlsi DesignMask LayoutVlsi Architecture +9