Hiroko Tashiro

Effect of fluorine on boron diffusion in thin silicon dioxides and oxynitride

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro et al. · Journal of Applied Physics · 1995 · 72 citations

Engineering, Thin Silicon Dioxides, Chemistry +16

Boron Diffusion Through Pure Silicon Oxide and Oxynitride Used for Metal‐Oxide‐Semiconductor Devices

Takayuki Aoyama, Kunihiro Suzuki, Hiroko Tashiro et al. · Journal of The Electrochemical Society · 1993 · 57 citations

Semiconductors, Materials Science, Electrical Engineering +12

Diffusion of Boron, Phosphorus, Arsenic, and Antimony in Thermally Grown Silicon Dioxide

Takayuki Aoyama, Hiroko Tashiro, Kunihiro Suzuki · Journal of The Electrochemical Society · 1999 · 38 citations

Materials Engineering, Chemical Engineering, Ion Implantation +15

Structural Analysis of Ag–In–Sb–Te Phase-Change Material

Hiroko Tashiro, Makoto Harigaya, Yoshiyuki Kageyama et al. · Japanese Journal of Applied Physics · 2002 · 33 citations

Optical Materials, Engineering, Solid-state Chemistry +18

Flatband voltage shift in PMOS devices caused by carrier activation in p+-polycrystalline silicon and by boron penetration

Takayuki Aoyama, Ken Suzuki, Hiroko Tashiro et al. · IEEE Transactions on Electron Devices · 2002 · 23 citations

Electrical Engineering, Engineering, Nanoelectronics +11