Thomas J. Knisley

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

Thomas J. Knisley, Lakmal C. Kalutarage, Charles H. Winter · Coordination Chemistry Reviews · 2013 · 140 citations

Materials Science, Engineering, Surface Science +8

Low Temperature Growth of High Purity, Low Resistivity Copper Films by Atomic Layer Deposition

Thomas J. Knisley, Thiloka C. Ariyasena, Timo Sajavaara et al. · Chemistry of Materials · 2011 · 77 citations

Materials Engineering, Materials Science, Copper Oxide Materials +15

Volatility and High Thermal Stability in Mid- to Late-First-Row Transition-Metal Diazadienyl Complexes

Thomas J. Knisley, M.J. Saly, Mary Jane Heeg et al. · Organometallics · 2011 · 52 citations

Materials Science, Inorganic Chemistry, High Thermal Stability +12

Thermal atomic layer deposition of ruthenium metal thin films using nonoxidative coreactants

Stefan Cwik, Keenan N. Woods, M.J. Saly et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2019 · 26 citations

Materials Science, Engineering, Nanotechnology +15

Exceptional thermal stability and high volatility in mid to late first row transition metal complexes containing carbohydrazide ligands

Mahesh C. Karunarathne, Thomas J. Knisley, Gabriel S. Tunstull et al. · Polyhedron · 2012 · 11 citations

Materials Science, Inorganic Chemistry, Engineering +7