Lakmal C. Kalutarage

Precursors and chemistry for the atomic layer deposition of metallic first row transition metal films

Thomas J. Knisley, Lakmal C. Kalutarage, Charles H. Winter · Coordination Chemistry Reviews · 2013 · 145 citations

Natural Sciences, Chemistry, Materials Science +12

Low-Temperature Atomic Layer Deposition of Copper Films Using Borane Dimethylamine as the Reducing Co-reagent

Lakmal C. Kalutarage, Scott B. Clendenning, Charles H. Winter · Chemistry of Materials · 2014 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +17

Volatile and Thermally Stable Mid to Late Transition Metal Complexes Containing α-Imino Alkoxide Ligands, a New Strongly Reducing Coreagent, and Thermal Atomic Layer Deposition of Ni, Co, Fe, and Cr Metal Films

Lakmal C. Kalutarage, Philip D. Martin, Mary Jane Heeg et al. · Journal of the American Chemical Society · 2013 · 46 citations

Natural Sciences, Chemistry, Materials Science +17

Synthesis, Structure, and Solution Reduction Reactions of Volatile and Thermally Stable Mid to Late First Row Transition Metal Complexes Containing Hydrazonate Ligands

Lakmal C. Kalutarage, Philip D. Martin, Mary Jane Heeg et al. · Inorganic Chemistry · 2013 · 11 citations

Natural Sciences, Chemistry, Crystal Structure +16

Volatility and High Thermal Stability in Mid-to-Late First-Row Transition-Metal Complexes Containing 1,2,5-Triazapentadienyl Ligands

Lakmal C. Kalutarage, Mary Jane Heeg, Philip D. Martin et al. · Inorganic Chemistry · 2013 · 10 citations

Natural Sciences, Chemistry, Crystal Structure +16