D. Münchmeyer - Concepedia

Concepedia

Author

D. Münchmeyer

FZI Research Center for Information Technology

Also Known As

D Munchmeyer, D. Munchmeyer, D. Münchmeyer

21

Publications

1.8K

Citations

15

H-Index

49

Concepts

All Affiliations

FZI Research Center for Information Technology Karlsruhe Institute of Technology Siemens (Germany)Swiss Federal Nuclear Safety Inspectorate STEAG (Germany)

DM

About

D. Münchmeyer is an author at FZI Research Center for Information Technology specializing in engineering, microfabrication, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	13	14	1.7K
2	Applied Physics	8	8	1.2K
3	Natural Sciences	3	3	76
4	Biomedical Engineering	2	2	76
5	Medicine	1	1	20

D. Münchmeyer

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17

Publications

1.8K

Citations

15

H-Index

	Year	Citations
Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process) E. W. Becker, W. Ehrfeld, Patric Hagmann, Microelectronic Engineering Materials ScienceEngineeringPlastic MouldingMicrofabricationDigital Fabrication	1986	957
Production of separation-nozzle systems for uranium enrichment by a combination of X-ray lithography and galvanoplastics Eberhard Backer, W. Ehrfeld, D. Münchmeyer, Die Naturwissenschaften Materials ScienceChemical EngineeringEngineeringNuclear Fuel EnrichmentSelective Separation	1982	199
Three-dimensional microfabrication using synchrotron radiation W. Ehrfeld, D. Münchmeyer Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment EngineeringMicromachinesMicrofabricationMicroscopyMechanical Engineering	1991	127
The LIGA technique-what are the new opportunities Arnd Rogner, Joanne Eicher, D. Münchmeyer, Journal of Micromechanics and Microengineering Materials ScienceMethodological DevelopmentNew OpportunitiesEngineeringFlexible Electronics	1992	104
LIGA process: sensor construction techniques via X-ray lithography W. Ehrfeld, Fabian Götz, D. Münchmeyer, EngineeringTarget FabricationMicroelectromechanical SystemsMicromanufacturingBiomedical Engineering	2003	56
Progress in deep-etch synchrotron radiation lithography W. Ehrfeld, P. Bley, Fabian Götz, Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena Materials SciencePhotonicsEngineeringBeryllium MembranesElectron-beam Lithography	1988	56
Requirements on resist layers in deep-etch synchrotron radiation lithography Jürgen Mohr, W. Ehrfeld, D. Münchmeyer Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena EngineeringElectron-beam LithographyMechanical EngineeringBeam LithographyPmma Layer	1988	52
Energy spectra of charged particles emitted following the absorption of stopped negative pions in 12C nuclei Günter Mechtersheimer, G. Büche, U. Klein, Nuclear Physics A Negative PionsHigh-energy Nuclear ReactionNuclear PhysicsPhysicsNatural Sciences	1979	38
Measurement of energy spectra of charged particles emitted after the absorption of stopped negative pions in carbon Günter Mechtersheimer, G. Büche, U. Klein, Physics Letters B Negative PionsPhysicsElectron SpectroscopyNatural SciencesSpectroscopy	1978	27
Manufacture of three-dimensional microdevices using synchrotron radiation (invited) D. Münchmeyer, J. Langen Review of Scientific Instruments EngineeringMechanical EngineeringMicromanufacturingMicro-optical ComponentSynchrotron Radiation Research	1992	27

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