Concepedia

J. Sugiura

JS

6

Publications

259

Citations

6

H-Index

1986

Active since

Affiliations

Hitachi (Japan)(Current)

University of Tsukuba

J. Sugiura is an author at Hitachi (Japan) specializing in engineering, applied physics, and materials science.

Top concepts

EngineeringApplied PhysicsPhysicsMaterial ScienceMicroelectronicsCrystalline DefectsSemiconductorsDefect ToleranceElectrical EngineeringNanoelectronics

Publications per year

1986–1991

6

Publications

6

Reactive ion etching of SiC thin films using fluorinated gases

J. Sugiura, W. Lu, Ken Cadien et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1986 · 99 citations

Engineering, Vacuum Device, Sio2 Films +18

A Study of Vacancy-Type Defects in B<sup>+</sup>-Implanted SiO<sub>2</sub>/Si by a Slow Positron Beam

Akira Uedono, Shoichiro Tanigawa, J. Sugiura et al. · Japanese Journal of Applied Physics · 1989 · 49 citations

Sio 2, Defect Tolerance, Incident Positron Energy +12

Defect Production in Phosphorus Ion-Implanted SiO<sub>2</sub>(43 nm)/Si Studied by a Variable-Energy Positron Beam

Akira Uedono, Long Wei, Chisei Dosho et al. · Japanese Journal of Applied Physics · 1991 · 35 citations

Materials Science, Semiconductors, Sio 2 +11

Reverse-bias current reduction in low-temperature-annealed silicon <i>p</i> <i>n</i> junctions by ultraclean ion-implantation technology

T. Nitta, T. Ohmi, Y. Ishihara et al. · Journal of Applied Physics · 1990 · 29 citations

Engineering, Stress Compensation Technology, Reverse-bias Current Reduction +18

Vacancy-Type Defects in As<sup>+</sup>-Implanted SiO<sub>2</sub>(43 nm)/Si Proved with Slow Positrons

Akira Uedono, Shoichiro Tanigawa, J. Sugiura et al. · Japanese Journal of Applied Physics · 1990 · 24 citations

Engineering, Positron Annihilation Spectroscopy, Slow Positrons +16

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