Wayne F. Connelly

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Active since

1995

Affiliations

Integrated Solutions for Systems (United States)(Current)

Wayne F. Connelly is an author at Integrated Solutions for Systems (United States) specializing in projection lithography, engineering, and electronic materials.

Publications per year

1995–1997

Publications

The SCattering with Angular Limitation in Projection Electron-Beam Lithography (SCALPEL) System

J. Alexander Liddle, Steven D. Berger, C. J. Biddick et al. · Japanese Journal of Applied Physics · 1995 · 21 citations

Engineering, Electrical Engineering, Electronic Materials +8

Preliminary results from a prototype projection electron-beam stepper-scattering with angular limitation projection electron beam lithography proof-of-concept system

L. R. Harriott, S. D. Berger, C. J. Biddick et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 21 citations

Engineering, Manufacturing Engineering, Materials Engineering +14

The SCALPEL proof of concept system

L. R. Harriott, S. D. Berger, C. J. Biddick et al. · Microelectronic Engineering · 1997 · 12 citations

Social Sciences, Mathematics, Knowledge Representation +3

SCALPEL proof-of-concept system: preliminary lithography results

W. K. Waskiewicz, Christopher J. Biddick, Myrtle I. Blakey et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1997 · 11 citations

Engineering, Manufacturing Engineering, Electronic Materials +11

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