Akira Koshiishi

Implementation of atomic layer etching of silicon: Scaling parameters, feasibility, and profile control

Alok Ranjan, Mingmei Wang, Sonam D. Sherpa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2016 · 40 citations

Engineering, Atomic Layer Etching, Silicon On Insulator +19

A case report on a very rare variant of popliteal artery entrapment syndrome due to an enlarged fabella associated with severe knee osteoarthritis

Yoshinari Miyamoto, Fumiaki Tokimura, Tatsu Nakazawa et al. · Journal of Orthopaedic Science · 2015 · 26 citations

Enlarged Fabella, Orthopaedic Surgery, Severe Knee Osteoarthritis +1

Investigation of Etch Rate Uniformity of 60 MHz Plasma Etching Equipment

Akira Koshiishi, Youichi Araki, Shinji Himori et al. · Japanese Journal of Applied Physics · 2001 · 23 citations

Electrical Engineering, Engineering, High-frequency Device +11

Highly selective and high rate SiO2 etching using argon-added C2F4/CF3I plasma

H. Ohtake, Hidetoshi Ishihara, Takashi Fuse et al. · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 2003 · 21 citations

Engineering, Electron-beam Lithography, High Rate Sio2 +20