Statistics
Publications
6
Citations
161
H-Index
6
Active since
2002
Affiliations
Grace Dai is an author at Luminex (United States) specializing in electrical engineering, engineering, and mask fabrication.
Publications per year
2002–2010
6
6
Trade-off between inverse lithography mask complexity and lithographic performance
Byung‐Gook Kim, Sung Soo Suh, Byung Sung Kim et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2009 · 58 citations
Engineering, Electrical Engineering, Manufacturing Engineering +11
Linyong Pang, Grace Dai, Tom Cecil et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2008 · 33 citations
Engineering, Computer Engineering, Electrical Engineering +12
Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation
Chi‐Yuan Hung, Bin Zhang, Eric Guo et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 2006 · 24 citations
Engineering, Computer Engineering, Electrical Engineering +13
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