Ronald M. Martino

A 0.25 μm CMOS SOI technology and its application to 4 Mb SRAM

D. Schepis, F. Assaderaghi, D. S. Yee et al. · 2002 · 51 citations

Low-power Electronics, Electrical Engineering, Engineering +10

Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS

Raymond Budd, D. B. Dove, John L. Staples et al. · IBM Journal of Research and Development · 1997 · 35 citations

Engineering, Measurement, Microscopy +20

<title>Quantitative stepper metrology using the focus monitor test mask</title>

Timothy A. Brunner, Alexander L. Martin, Ronald M. Martino et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 33 citations

Engineering, Measurement, Optical Testing +18

<title>Some image modeling issues for I-line, 5X phase-shifting masks</title>

G. Wojcik, John Mould, Richard A. Ferguson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 26 citations

Engineering, Better Psm Metrology, Emflex Finite Element +17

<title>Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs</title>

Lars W. Liebmann, Thomas H. Newman, Richard A. Ferguson et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 13 citations

Electrical Engineering, Engineering, Vlsi Design +13