John L. Staples

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Active since

1994

Affiliations

IBM Research - Thomas J. Watson Research Center(Current)

IBM (United States)

John L. Staples is an author at IBM Research - Thomas J. Watson Research Center specializing in phase-shift lithography, phase shift masks, and engineering.

Publications per year

1994–1998

Publications

Development and application of a new tool for lithographic mask evaluation, the stepper equivalent Aerial Image Measurement System, AIMS

Raymond Budd, D. B. Dove, John L. Staples et al. · IBM Journal of Research and Development · 1997 · 35 citations

Engineering, Manufacturing Engineering, Computer Vision +16

<title>New tool for phase-shift mask evaluation: the stepper equipment aerial image measurement system--AIMS</title>

R. Budd, John L. Staples, D. B. Dove · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 28 citations

Natural Sciences, Computer Science, Digital Imaging +12

A 10.5-in.-diagonal SXGA active-matrix display

E. G. Colgan, P.M. Alt, R. Wisnieff et al. · IBM Journal of Research and Development · 1998 · 20 citations

Engineering, Electrical Engineering, Materials Science +14

<title>New mask evaluation tool: the microlithography simulation microscope aerial image measurement system</title>

R. Budd, D. B. Dove, John L. Staples et al. · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1994 · 11 citations

Engineering, Biomedical Engineering, Microfabrication +15

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