Statistics
Publications
27
Citations
1.9K
H-Index
18
Active since
1970
Eiji HASEGAWA is an author at NEC (Japan) specializing in engineering, materials science, and semiconductor devices.
Publications per year
1970–2019
27
27
Growth of native oxide on a silicon surface
Mizuho Morita, T. Ohmi, Eiji HASEGAWA et al. · Journal of Applied Physics · 1990 · 885 citations · Full text
Mechanism of leakage current through the nanoscale SiO2 layer
Seido Nagano, Masaru Tsukiji, K. Ando et al. · Journal of Applied Physics · 1994 · 54 citations
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