Yoshinobu Ohya

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 145 citations · Full text

Engineering, Electrical Engineering, Manufacturing Engineering +15

Human glycine decarboxylase gene ( GLDC) and its highly conserved processed pseudogene ( ψ GLDC) : their structure and expression, and the identification of a large deletion in a family with nonketotic hyperglycinemia

M. Takayanagi, Shuichi KURE, Yasushi Sakata et al. · Human Genetics · 2000 · 40 citations

Life Sciences, Genetics, Molecular Genetics +11

An approach to reduce surface charging with cryogenic plasma etching using hydrogen-fluoride contained gases

Shih‐Nan Hsiao, Makoto Sekine, Kenji Ishikawa et al. · Applied Physics Letters · 2023 · 29 citations

Natural Sciences, Materials Science, Physics +17

Rapid electron density decay observed by surface-wave probe in afterglow of pulsed fluorocarbon-based plasma

Yoshinobu Ohya, Manabu Iwata, Kenji Ishikawa et al. · Japanese Journal of Applied Physics · 2016 · 18 citations

Natural Sciences, Chemistry, Physics +15

Spatial profiles of interelectrode electron density in direct current superposed dual-frequency capacitively coupled plasmas

Yoshinobu Ohya, Kenji Ishikawa, Tatsuya Komuro et al. · Journal of Physics D Applied Physics · 2017 · 18 citations · Full text

Natural Sciences, Electrical Engineering, Physics +13