W. Tsai - Concepedia

Author

W. Tsai

Varian Medical Systems (United States)

Also Known As

Tsai W.-K., W. H. Tsai, W. Tsai, W.H. TSAI, WK Tsai

Publications

463

Citations

H-Index

Concepts

All Affiliations

Varian Medical Systems (United States)Carleton University University of Alberta

About

W. Tsai is an author at Varian Medical Systems (United States) specializing in engineering, applied physics, and surface science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	11	11	366
2	Applied Physics	10	10	298
3	Chemistry	3	3	78
4	Chemical Engineering	1	1	19
5	Computer Science	1	1	68

W. Tsai

Publications

420

Citations

H-Index

Page 1

	Year	Citations
Diamond MESFET using ultrashallow RTP boron doping W. Tsai, M. Delfino, D. Hodul, IEEE Electron Device Letters SemiconductorsCubic BoronElectrical EngineeringElectronic DevicesEngineering	1991	72
Random testing revisited PS Loo, W. Tsai Information and Software Technology EngineeringTesting TechniqueLanguage TestingVerificationSoftware Testing	1988	68
Correlation of electrical resistivity and grain size in sputtered titanium films M. E. Day, M. Delfino, J. A. Fair, Thin Solid Films	1995	54
Temperature dependence of the electrical resistivity of reactively sputtered TiN films W. Tsai, M. Delfino, J. A. Fair, Journal of Applied Physics EngineeringTemperature DependenceThin Film Process TechnologyChemical DepositionElectrical Resistivity	1993	49
Plasma cleaned Si analyzed <i>in</i> <i>situ</i> by x-ray photoelectron spectroscopy, secondary ion mass spectrometry, and actinometry M. Delfino, S. Salimian, D. Hodul, Journal of Applied Physics EngineeringIon Beam InstrumentationChemistrySilicon On InsulatorPlasma Processing	1992	43
Experimental study and computer simulation of collimated sputtering of titanium thin films over topographical features D. Liu, S. K. Dew, Michael J. Brett, Journal of Applied Physics Materials ScienceSurface TechnologyMaterials EngineeringComputer SimulationEngineering	1993	36
Properties of titanium and aluminum thin films deposited by collimated sputtering D. Liu, S. K. Dew, Michael J. Brett, Thin Solid Films Materials EngineeringMaterials ScienceEngineeringSurface ScienceApplied Physics	1993	22
Correlation of plasma and surface chemistry during electron cyclotron resonance hydrogen etching of native silicon oxide W. Tsai, M. Delfino, M. E. Day, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Materials ScienceChemical EngineeringEngineeringSurface ChemistryNanoelectronics	1993	19
X-ray photoemission analysis and electrical contact properties of NF3 plasma cleaned Si surfaces M. Delfino, B.-C. Chung, W. Tsai, Journal of Applied Physics EngineeringNative Silicon OxideVacuum DeviceChemistryPlasma Processing	1992	16
Compositional variations in Ti-W films sputtered over topographical features D. Liu, S. K. Dew, Michael J. Brett, Journal of Applied Physics Materials ScienceMaterials EngineeringSurface CharacterizationEngineeringPhysics	1994	16

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