D. Hodul - Concepedia

Author

D. Hodul

Varian Medical Systems (United States)

Also Known As

D. Hodul, D. T. HODUL, D. T. Hodul, D.T. Hodul, David Hodul, David T. Hodul

Publications

712

Citations

H-Index

Concepts

All Affiliations

Varian Medical Systems (United States)University of California, Berkeley

About

D. Hodul is an author at Varian Medical Systems (United States) specializing in applied physics, engineering, and materials science.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	12	15	597
2	Applied Physics	12	13	534
3	Natural Sciences	5	5	256
4	Arts	1	1	19
5	Chemical Engineering	1	1	49

D. Hodul

Publications

634

Citations

H-Index

Page 1

	Year	Citations
Raman spectra of IVB and VIB transition metal disulfides using laser energies near the absorption edges Angelica M. Stacy, D. Hodul Journal of Physics and Chemistry of Solids Laser EnergiesRaman SpectraAbsorption EdgesTransition Metal ChalcogenidesEngineering	1985	146
Diamond MESFET using ultrashallow RTP boron doping W. Tsai, M. Delfino, D. Hodul, IEEE Electron Device Letters SemiconductorsCubic BoronElectrical EngineeringElectronic DevicesEngineering	1991	72
X-ray photoemission spectra of reactively sputtered TiN M. Delfino, J. A. Fair, D. Hodul Journal of Applied Physics Materials ScienceMaterials EngineeringX-ray CrystallographyMaterial AnalysisX-ray Spectroscopy	1992	63
Temperature dependence of the electrical resistivity of reactively sputtered TiN films W. Tsai, M. Delfino, J. A. Fair, Journal of Applied Physics EngineeringTemperature DependenceThin Film Process TechnologyChemical DepositionElectrical Resistivity	1993	49
A new approach to the generation of metal-bearing, medium-pore, shape-selective zeolites for fischer-tropsch catalysis: spectroscopic studies of zeolites Lennox E. Iton, Richard B. Beal, D. Hodul Journal of Molecular Catalysis Materials ScienceChemical EngineeringCatalytic ApplicationEngineeringFischer-tropsch Catalysis	1983	49
Plasma cleaned Si analyzed <i>in</i> <i>situ</i> by x-ray photoelectron spectroscopy, secondary ion mass spectrometry, and actinometry M. Delfino, S. Salimian, D. Hodul, Journal of Applied Physics EngineeringIon Beam InstrumentationChemistrySilicon On InsulatorPlasma Processing	1992	43
Anomalies in the properties of Hf(S2−xTex)1−y and Hf(Se2−xTex)1−y near the metal-insulator transition D. Hodul, Angelica M. Stacy Journal of Solid State Chemistry Transition Metal ChalcogenidesEngineeringPhysicsTopological InsulatorApplied Physics	1984	41
Rapid thermal annealing/chemical vapor deposition and integrated processing D. Hodul, Jeffrey C. Gelpey, M.L. Green, Materials ScienceMaterials EngineeringIon ImplantationEngineeringIon Implant	1989	35
Raman scattering study of rapid thermal annealing of As+-implanted Si D. Kirillov, R. A. Powell, D. Hodul Journal of Applied Physics Materials ScienceElectrical EngineeringIon ImplantationEngineeringNanoelectronics	1985	22
Hf(SexTe1-x)2: deviation from Vegard's law in mixed systems D. Hodul, M. J. Sienko Inorganic Chemistry AltmetricsBiophysical ModelingBiophysicsNatural SciencesInformation	1981	19

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