Concepedia

Yasuhisa Inao

YI

3

Publications

82

Citations

3

H-Index

2005

Active since

Affiliations

Canon (Japan)(Current)

Yasuhisa Inao is an author at Canon (Japan) specializing in applied physics, engineering, and microfabrication.

Top concepts

Publications per year

2005–2007

3

Publications

3

Fabrication of half-pitch 32nm resist patterns using near-field lithography with a-Si mask

Toshiki Ito, Tomohiro Yamada, Yasuhisa Inao et al. · Applied Physics Letters · 2006 · 30 citations

, , +18

Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process

Toshiki Ito, Masaya Ogino, Tomohiro Yamanaka et al. · Journal of Photopolymer Science and Technology · 2005 · 28 citations · Full text

, , +20

Near-field lithography as prototype nano-fabrication tool

Yasuhisa Inao, Shinji Nakasato, R. Kuroda et al. · Microelectronic Engineering · 2007 · 24 citations

, , +8

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