R. Kuroda - Concepedia

Author

R. Kuroda

National Institute of Advanced Industrial Science and Technology

Also Known As

Kuroda, R., R Kuroda, R. Kuroda, Ryo KURODA, Ryo Kuroda, Ryouhei Kuroda

268

Publications

808

Citations

H-Index

Concepts

All Affiliations

National Institute of Advanced Industrial Science and Technology Canon (Japan)Yamato University Nippon Institute of Technology National Epilepsy Center

About

R. Kuroda is an author at National Institute of Advanced Industrial Science and Technology specializing in engineering, materials science, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	14	19	642
2	Applied Physics	12	16	413
3	Natural Sciences	3	3	236
4	Medicine	2	2	28
5	Health Sciences	1	1	16

R. Kuroda

Publications

739

Citations

H-Index

Page 1

	Year	Citations
Cloning and expression of UDP-glucose: flavonoid 7-O-glucosyltransferase from hairy root cultures of Scutellaria baicalensis Masao Hirotani, R. Kuroda, Hideyuki Suzuki, Planta BiologyBiosynthesisEngineeringBiotransformationBiochemistry	2000	136
Measurement of ultrafast dephasing time of Cresyl Fast Violet in cellulose by photon echoes with incoherent light Masahiro Fujiwara, Hiroki Nakatsuka, R. Kuroda Journal of the Optical Society of America B Incoherent LightEngineeringLaser ApplicationsExcited 6250Ultrafast Dephasing Time	1985	76
Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of β-FeSi2 optoelectronic devices Teruhisa Ootsuka, Zheng-Xin Liu, Masato Osamura, Thin Solid Films Materials ScienceElectrical EngineeringOptical MaterialsEngineeringOxide Electronics	2005	63
Nanometer scale conductance change in a Langmuir-Blodgett film with the atomic force microscope Koji Yano, Masafumi Kyogaku, R. Kuroda, Applied Physics Letters Lb Film ChangesEngineeringMicroscopyLangmuir-blodgett FilmTunneling Microscopy	1996	58
Reduction of iron diffusion in silicon during the epitaxial growth of β-FeSi2 films by use of thin template buffer layers Zheng-Xin Liu, Yasuhito Suzuki, Masato Osamura, Journal of Applied Physics Materials Scienceβ-Fesi2 FilmsEngineeringCrystalline DefectsSurface Science	2004	38
Fabrication of half-pitch 32nm resist patterns using near-field lithography with a-Si mask Toshiki Ito, Tomohiro Yamada, Yasuhisa Inao, Applied Physics Letters EngineeringElectron-beam LithographyHalf-pitch 32NmOptoelectronic DevicesIntegrated Circuits	2006	30
In Situ Topology of Cytochrome b5 in the Endoplasmic Reticulum Membrane R. Kuroda, J.-y. Kinoshita, Masanori Honsho, The Journal of Biochemistry	1996	29
Doping of β-FeSi2 films with boron and arsenic by sputtering and its application for optoelectronic devices Zheng-Xin Liu, Masato Osamura, Teruhisa Ootsuka, Optical Materials Materials EngineeringMaterials ScienceSemiconductor Technologyβ-Fesi2 FilmsEngineering	2004	28
Fabrication of sub-100nm Patterns using Near-field Mask Lithography with Ultra-thin Resist Process Toshiki Ito, Masaya Ogino, Tomohiro Yamanaka, Journal of Photopolymer Science and Technology EngineeringElectron-beam LithographyPattern TransferIntegrated CircuitsNear-field Mask Lithography	2005	28
Arabidopsis phosphatidylinositol 4‐phosphate 5‐kinase genes <i>PIP5K7</i>, <i>PIP5K8</i>, and <i>PIP5K9</i> are redundantly involved in root growth adaptation to osmotic stress R. Kuroda, Mariko Kato, Tomohiko Tsuge, The Plant Journal	2021	27

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