Peer Reviewed: Looking at Trace Impurities on Silicon Wafers with Synchrotron Radiation

Abstract

ADVERTISEMENT RETURN TO ISSUEPREVFeaturesNEXTPeer Reviewed: Looking at Trace Impurities on Silicon Wafers with Synchrotron RadiationBecause even very low levels of metal impurities can seriously degrade silicon integrated circuits, extremely sensitive methods must be developed to improve wafer cleaning.Katharina Baur, Sean Brennan, Piero Pianetta, and Robert OpilaCite this: Anal. Chem. 2002, 74, 23, 608 A–616 APublication Date (Web):December 1, 2002Publication History Published online1 December 2002Published inissue 1 December 2002https://pubs.acs.org/doi/10.1021/ac022159vhttps://doi.org/10.1021/ac022159vnewsACS Publications. This publication is available under these Terms of Use. Request reuse permissions This publication is free to access through this site. Learn MoreArticle Views1678Altmetric-Citations17LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InRedditEmail PDF (615 KB) Get e-Alertsclose SUBJECTS:Impurities,Silicon,Synchrotron radiation Get e-Alerts