Effect of rotation of abrasives on material removal in chemical mechanical polishing using a proposed three-body model: Molecular dynamics simulation

VMD: Visual molecular dynamics

William Humphrey, Andrew Dalke, Klaus Schulten · Journal of Molecular Graphics · 1996 · 66.6K citations

Natural Sciences, Biophysics, Physics +12

Material removal mechanism in chemical mechanical polishing: theory and modeling

Jianfeng Luo, David Dornfeld · IEEE Transactions on Semiconductor Manufacturing · 2001 · 641 citations

Engineering, Materials Engineering, Materials Science +16

Converting Ceria Polyhedral Nanoparticles into Single-Crystal Nanospheres

Xiangdong Feng, Dean C. Sayle, Zhong Lin Wang et al. · Science · 2006 · 611 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Chemical‐Mechanical Polishing for Fabricating Patterned W Metal Features as Chip Interconnects

F. B. Kaufman, Daniel B. Thompson, R. E. Broadie et al. · Journal of The Electrochemical Society · 1991 · 511 citations

Engineering, Materials Engineering, Materials Science +17

Nonequilibrium molecular dynamics via Gauss's principle of least constraint

Denis J. Evans, William G. Hoover, B. H. Failor et al. · Physical review. A, General physics · 1983 · 437 citations

Natural Sciences, Chemistry, Physics +17