Concepedia

Inherent selective pulsed chemical vapor deposition of amorphous hafnium oxide / titanium oxide nanolaminates

Yunil Cho, James Huang, Christopher F. Ahles, Zichen Zhang, Keith T. Wong, Srinivas Nemani, Ellie Yieh, Andrew C. Kummel

Applied Surface Science · 2022 · 11 citations · 31 references

DOI

Concepts

References

31

The use of atomic layer deposition in advanced nanopatterning

Adriaan J. M. Mackus, Ageeth A. Bol, W. M. M. Kessels · Nanoscale · 2014 · 380 citations

, , +14

Surface morphology and crystallinity control in the atomic layer deposition (ALD) of hafnium and zirconium oxide thin films

Dennis M. Hausmann, Roy G. Gordon · Journal of Crystal Growth · 2003 · 311 citations

, , +17

ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements

Jeffrey W. Elam, Z. A. Sechrist, Steven M. George · Thin Solid Films · 2002 · 260 citations

, , +16

Plasma enhanced chemical vapor deposited SiCOH dielectrics: from low-<i>k</i> to extreme low-<i>k</i> interconnect materials

A. Grill · Journal of Applied Physics · 2003 · 250 citations

, , +17

Area-Selective Atomic Layer Deposition Assisted by Self-Assembled Monolayers: A Comparison of Cu, Co, W, and Ru

Dara Bobb-Semple, Katie L. Nardi, Nerissa Draeger et al. · Chemistry of Materials · 2019 · 194 citations

, , +17