Air-based deposition of titanium‑aluminum oxynitride thin films by reactive magnetron sputtering

Revised effective ionic radii and systematic studies of interatomic distances in halides and chalcogenides

R. D. Shannon · Acta Crystallographica Section A · 1976 · 64.8K citations

Natural Sciences, Chemistry, Materials Science +17

Titanium aluminum nitride films: A new alternative to TiN coatings

Wolf‐Dieter Münz · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 947 citations

Natural Sciences, Materials Engineering, Materials Science +17

Reactive-sputter-deposited TiN films on glass substrates

Joshua Pelleg, Levy Zevin, S. Lungo et al. · Thin Solid Films · 1991 · 744 citations

Natural Sciences, Materials Engineering, Materials Science +14

Performance of PVD TiN, TiCN, and TiAlN coated cemented carbide tools in turning

Prem C. Jindal, A. T. Santhanam, Uwe Schleinkofer et al. · International Journal of Refractory Metals and Hard Materials · 1999 · 440 citations

Engineering, Materials Engineering, Materials Science +9

The O−Ti (Oxygen-Titanium) system

J. L. Murray, H. A. Wriedt · Journal of Phase Equilibria · 1987 · 316 citations

Natural Sciences, Materials Engineering, Materials Science +9