Surface corrosion inhibition mechanism of sarcosine as a green novel inhibitor on a novel barrier layer material of cobalt in copper film CMP for GLSI

References

Page 1

	Year	Citations
Chemical mechanical planarization for microelectronics applications Parshuram B. Zantye, Ashok Kumar, A. K. Sikder Materials Science and Engineering R Reports Materials ScienceEngineeringMicrofabricationMechanical EngineeringNano Electro Mechanical System	2004	600
Compilation of PZC and IEP of sparingly soluble metal oxides and hydroxides from literature Marek Kosmulski Advances in Colloid and Interface Science Materials ScienceInorganic ChemistryEngineeringSoluble Metal OxidesOxide Electronics	2009	443
Chromium-based regulations and greening in metal finishing industries in the USA Anil Baral, Robert Engelken Environmental Science & Policy Materials ScienceSustainable ManufacturingChemical EngineeringChromium-based RegulationsEngineering	2002	350
Environment friendly chemical mechanical polishing of copper Zhenyu Zhang, Junfeng Cui, Jiabo Zhang, Applied Surface Science Materials ScienceMaterials EngineeringChemical EngineeringEngineeringCorrosion	2018	300
Chemistry of corrosion inhibitors James M. Gaidis Cement and Concrete Composites Chemical EngineeringCorrosion ProtectionEngineeringCorrosionChemistry	2003	266
A novel approach of chemical mechanical polishing for a titanium alloy using an environment-friendly slurry Zhenyu Zhang, Zhifeng Shi, Yuefeng Du, Applied Surface Science Materials ScienceMaterials EngineeringChemical EngineeringEngineeringMaterial Processing	2017	237
Development of a novel chemical mechanical polishing slurry and its polishing mechanisms on a nickel alloy Zhenyu Zhang, Longxing Liao, Xinze Wang, Applied Surface Science Materials ScienceMaterials EngineeringChemical EngineeringEngineeringPowder Metallurgy	2019	199
Green chemical mechanical polishing of sapphire wafers using a novel slurry Wenxiang Xie, Zhenyu Zhang, Longxing Liao, Nanoscale	2020	196
Chemical processes in the chemical mechanical polishing of copper Joseph M. Steigerwald, S. P. Murarka, R.J. Gutmann, Materials Chemistry and Physics Materials ScienceChemical EngineeringEngineeringMaterial ProcessingCorrosion	1995	195
A novel slurry for chemical mechanical polishing of single crystal diamond Longxing Liao, Zhenyu Zhang, Fanning Meng, Applied Surface Science Materials ScienceMaterials EngineeringDiamond-like CarbonEngineeringMaterial Processing	2021	181

Page 1