Characterization of SiO<sub>2</sub> Over Poly-Si Mask Etching in Ar/C<sub>4</sub>F<sub>8</sub> Capacitively Coupled Plasma - Concepedia

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Characterization of SiO<sub>2</sub> Over Poly-Si Mask Etching in Ar/C<sub>4</sub>F<sub>8</sub> Capacitively Coupled Plasma

DOI Full Paper Access

25

Citations

12

References

2021

Year

Inho Seong, Jang Jae Lee, Chul‐Hee Cho, Yeong Seok Lee, Sijun Kim, S. J. You

Applied Science and Convergence Technology

Electrical EngineeringPlasma ElectronicsEngineeringMicrofabricationSurface ScienceApplied PhysicsPoly-si Mask EtchingMicroelectronicsPlasma EtchingPlasma ProcessingPlasma Application

References

	Year	Citations

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