S. J. You - Concepedia

Author

S. J. You

Chungnam National University ORCID

Also Known As

Eui-chan Jang, Geun-Young Yeom, S -J You, S J YOU, S J You, S. J. You, S.-J. You, S.J. You, Seung-Min You, Shin Jae You

203

Publications

1.6K

Citations

H-Index

Concepts

All Affiliations

Chungnam National University Korea Research Institute of Standards and Science Korea Advanced Institute of Science and Technology Korea Institute of Machinery & Materials Korea Institute of Fusion Energy

About

S. J. You is an author at Chungnam National University specializing in engineering, physics, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	21	40	1K
2	Applied Physics	19	32	768
3	Natural Sciences	13	15	392
4	Education	2	2	37
5	Medicine	1	1	15

S. J. You

Publications

1.3K

Citations

H-Index

Page 1

	Year	Citations
Abnormal Heating of Low-Energy Electrons in Low-Pressure Capacitively Coupled Discharges G.Y. Park, S. J. You, Felipe Iza, Physical Review Letters Electrical EngineeringEngineeringPhysicsRf Excitation FrequencyGlow Discharge	2007	63
Power dissipation mode transition by a magnetic field S. J. You, C. W. Chung, K. H. Bai, Applied Physics Letters MagnetismElectrical EngineeringEngineeringPhysicsMagnetized Discharge	2002	51
An analysis on transmission microwave frequency spectrum of cut-off probe Daewoong Kim, S. J. You, B. K. Na, Applied Physics Letters Different ResonancesEngineeringRadio FrequencyMicrowave TransmissionPlasma Physics	2011	47
Correlation between excitation temperature and electron temperature with two groups of electron energy distributions Ho-Yong Park, S. J. You, Wonho Choe Physics of Plasmas Electron Excitation TemperatureEngineeringPlasma ScienceElectron Energy DistributionsPlasma Physics	2010	41
Flat cutoff probe for real-time electron density measurement in industrial plasma processing H. J. Yeom, J H Kim, Dae Hee Choi, Plasma Sources Science and Technology EngineeringMeasurementFlat Cutoff ProbePlasma SciencePlasma Physics	2019	41
Effects of substrate bias voltage on plasma parameters in temperature control using a grid system K. H. Bai, Jimin Hong, S. J. You, Physics of Plasmas EngineeringPlasma PhysicsPlasma ProcessingTemperature ControlPlasma Electronics	2001	40
Electron and ion kinetics in magnetized capacitively coupled plasma source SH Lee, S. J. You, H. Y. Chang, Journal of Vacuum Science & Technology A Vacuum Surfaces and Films Ion KineticsMagnetismEngineeringPhysicsMagnetized Plasma Physics	2007	40
Characterization of SiO2 Etching Profiles in Pulse-Modulated Capacitively Coupled Plasmas Chul‐Hee Cho, Sijun Kim, Youngseok Lee, Materials	2021	37
A self-consistent global model of solenoidal-type inductively coupled plasma discharges including the effects of radio-frequency bias power Deuk-Chul Kwon, Won Seok Chang, Min Park, Journal of Applied Physics EngineeringGlow DischargePlasma PhysicsPlasma DischargesPlasma Theory	2011	36
Nonlocal to local transition of electron kinetic property in magnetized plasma S. J. You, H. Y. Chang Physics of Plasmas MagnetismEngineeringPhysicsMagnetized Plasma PhysicsPlasma Theory	2006	36

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