Concepedia

Author

Inho Seong

Chungnam National UniversityORCID

Also Known As

I H Seong, In Ho Seong, In-Ho Seong, In-ho Seong, Inho Seong

29

Publications

162

Citations

7

H-Index

8

Concepts

All Affiliations

Chungnam National UniversitySamsung (South Korea)
IS

About

Inho Seong is an author at Chungnam National University specializing in microelectronics, engineering, and electrical engineering.

Top Concepts

#ConceptH-IndexPublicationsCitations

1

Engineering

2

2

35

2

Applied Physics

2

2

35

3

Electrical Engineering

2

2

35

4

Materials Engineering

1

1

10

5

Materials Science

1

1

10

Inho Seong

×

7

Publications

92

Citations

7

H-Index

YearCitations

Characterization of SiO<sub>2</sub> Over Poly-Si Mask Etching in Ar/C<sub>4</sub>F<sub>8</sub> Capacitively Coupled Plasma

Inho Seong, Jang Jae Lee, Chul‐Hee Cho,

Applied Science and Convergence Technology

2021

25

Influence of Additive N2 on O2 Plasma Ashing Process in Inductively Coupled Plasma

Yebin You, Youngseok Lee, Sijun Kim,

Nanomaterials

2022

14

Characterization of an Etch Profile at a Wafer Edge in Capacitively Coupled Plasma

Inho Seong, Jinho Lee, Sijun Kim,

Nanomaterials

2022

12

Characterization of SiO2 Plasma Etching with Perfluorocarbon (C4F8 and C6F6) and Hydrofluorocarbon (CHF3 and C4H2F6) Precursors for the Greenhouse Gas Emissions Reduction

Minsu Choi, Youngseok Lee, Yebin You,

Materials

2023

11

Various evolution trends of sample thickness in fluorocarbon film deposition on SiO2

Youngseok Lee, Inho Seong, Jangjae Lee,

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

2021

10

Purgeless atomic layer etching of SiO<sub>2</sub>

Youngseok Lee, Sijun Kim, Jangjae Lee,

Journal of Physics D Applied Physics

2022

10

Contribution of Ion Energy and Flux on High-Aspect Ratio SiO2 Etching Characteristics in a Dual-Frequency Capacitively Coupled Ar/C4F8 Plasma: Individual Ion Energy and Flux Controlled

Wonnyoung Jeong, Sijun Kim, Youngseok Lee,

Materials

2023

10

Page 1