Study on the effect of ceria concentration on the silicon oxide removal rate in chemical mechanical planarization

Chemical processes in glass polishing

Lee M. Cook · Journal of Non-Crystalline Solids · 1990 · 989 citations

Natural Sciences, Chemistry, Materials Science +11

Mechanism of polishing of SiO2 films by CeO2 particles

Tetsuya Hoshino, Y. Kurata, Yuuki Terasaki et al. · Journal of Non-Crystalline Solids · 2001 · 306 citations

Natural Sciences, Materials Engineering, Materials Science +14

Modification of the Preston equation for the chemical–mechanical polishing of copper

Qiuliang Luo, S. Ramarajan, S. V. Babu · Thin Solid Films · 1998 · 168 citations

Natural Sciences, Materials Engineering, Materials Science +11

Ceria concentration effect on chemical mechanical polishing of optical glass

Liangyong Wang, Kailiang Zhang, Zhitang Song et al. · Applied Surface Science · 2006 · 136 citations

Natural Sciences, Materials Engineering, Materials Science +13

Effect of Particle Size during Tungsten Chemical Mechanical Polishing

M. Bielmann · Electrochemical and Solid-State Letters · 1999 · 135 citations

Engineering, Materials Engineering, Materials Science +14