Concepedia

Modification of block copolymer lithography masks by O<sub>2</sub>/Ar plasma treatment: insights from lift-off experiments, nanopore etching and free membranes

Katharina Brassat, Daniel Kool, J.K.N. Lindner

Nanotechnology · 2019 · 11 citations · 38 references

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Concepts

Abstract

substrate by reactive ion etching. The direct analysis of free polymer membranes released from the substrate reveals the nanopore shape at the mask top and bottom surfaces.

References

38

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