Planar cutoff probe for measuring the electron density of low-pressure plasmas

Abstract

The cutoff probe (CP) is a precise diagnostic technique that measures electron density using two cylindrical probe tips and holders inserted in a low-pressure plasma. However, a recent study has reported that the insertion of the probe tips and holders can perturb the plasma condition and act as a source of error in the measurement of electron density. This study proposes a planar cutoff probe (PCP), which does not have invasive probe tips and holders, to minimize the plasma perturbation during plasma measurement. We embed the PCP on the existing substrate chuck of the plasma chamber instead of inserting an additional probe holder into the chamber. The adjusted conditions for the radii of the probe's antennas and the gap distance between the two probe antennas are obtained via an electromagnetic simulation. The comparative experiment results show that the inferred electron densities of the optimized PCP are in good agreement with those of the previous CP and within reasonable discrepancies stemming from the differences in measurement positions. We believe that the PCP, which can be embedded in the inner surface of the chamber and measure the electron density during the plasma (wafer) process, would be an alternative technical tool to realize advanced process control of plasma based on non-invasive diagnostic methods.