Applied Physics Express · 2018 · 24 citations · 27 references
Natural SciencesMaterials EngineeringMaterials ScienceMaterials CharacterizationSpectroscopic AnalysisSpectroscopyDefect CharacterizationDislocations In SemiconductorsMicrostructure AnalysisOptical SpectroscopyRaman SpectroscopySemiconductor DefectsDislocation BehaviorDislocation CharacterizationDislocation Contrast ImagingDislocation DensityGallium Nitride (Gan) MaterialsRaman ImagingThreading DislocationsX-ray Topography
We succeeded in measuring the density and direction of the edge component of threading dislocations (TDs) in c-plane (0001) GaN by micro-Raman spectroscopy mapping. In the micro-Raman spectroscopy mapping of the E2H peak shift between 567.85 and 567.75 cm−1, six different contrast images are observed toward directions of . By comparing X-ray topography and etch pit images, the E2H peak shift is observed where the edge component of TDs exists. In contrast, the E2H peak is not observed where the screw component of TDs exists.
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Scattering of electrons at threading dislocations in GaN
Nils Weimann, L.F. Eastman, D. Doppalapudi et al. · Journal of Applied Physics · 1998 · 615 citations
Characterization of threading dislocations in GaN epitaxial layers
T. Hino, Shigetaka Tomiya, T. Miyajima et al. · Applied Physics Letters · 2000 · 400 citations