Publication | Closed Access
A comparative study of CF 4 , Cl 2 and HBr + Ar inductively coupled plasmas for dry etching applications
38
Citations
39
References
2017
Year
Materials ScienceEngineeringCf 4Dry Etching ApplicationsPlasma ConfinementNonthermal PlasmaPlasma ApplicationPlasma EtchingComparative StudyPlasma Processing
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