A high reliability metal insulator metal capacitor for 0.18 μm copper technology

Abstract

A high reliability Metal-Insulator-Metal capacitor integrated into a 0.18 /spl mu/m CMOS foundry technology using Copper interconnects is discussed. Integration solutions specific to Copper processing are described and process yield and reliability results are presented on 0.72 fF//spl mu/m/sup 2/ capacitors. Performance and reliability metrics are shown to be comparable to those formed on Aluminum technologies.