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16-60 V rated LDMOS show advanced performance in a 0.72 μm evolution BiCMOS power technology
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Citations
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References
2002
Year
Unknown Venue
Low-power ElectronicsWide-bandgap SemiconductorElectrical EngineeringSemiconductor TechnologyEngineeringPower DeviceNanoelectronicsPerformance AdvancesImproved Multi VoltageApplied PhysicsPower Semiconductor DeviceLdmos ShowPower ElectronicsMicroelectronics16-60 VOptoelectronicsSemiconductor DeviceConventional Lateral Technology
In this work, performance advances are featured for new and improved multi voltage rated (16 V to 60 V) LDMOS. Performance improvements were achieved by leveraging off of (1) an optimized off-set, photo aligned, coimplanted double-diffused well (DWL), (2) two n-type dopings in the drift region, and (3) shrink from 1.0 /spl mu/m to 0.72 /spl mu/m. The R/sub sp/ vs. BV/sub dss/ trend for these devices is the best reported to date for conventional lateral technology: @V/sub gs/=12.75 V (3 MV/cm) R/sub sp/=0.95 m/spl Omega/ cm/sup 2/, BV=69.3 V; R/sub sp/=0.68 m/spl Omega/ cm/sup 2/, BV=50.0 V; R/sub sp/=0.45 m/spl Omega/ cm/sup 2/, BV=33.0 V; R/sub sp/=0.36 m/spl Omega/ cm/sup 2/, BV=19.0 V; for 60, 40, 25, and 16 V rated conventional LDMOS devices.
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