Pressure dependence of (Ti, Al)N film growth on inner walls of small holes in high-power impulse magnetron sputtering

A novel pulsed magnetron sputter technique utilizing very high target power densities

V. Kouznetsov, K. Macák, Jochen M. Schneider et al. · Surface and Coatings Technology · 1999 · 1K citations

Electrical Engineering, Engineering, Magnetron Sputter Technique +3

High power impulse magnetron sputtering discharge

N. Brenning, Daniel Lundin, Ulf Helmersson · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2012 · 716 citations · Full text

Electrical Engineering, Hipims Discharge, Engineering +11

High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering

André Anders, Joakim Andersson, Arutiun P. Ehiasarian · Journal of Applied Physics · 2007 · 340 citations · Full text

Materials Engineering, Electrical Engineering, Engineering +12

Phase transition and properties of Ti–Al–N thin films prepared by r.f.-plasma assisted magnetron sputtering

Min Zhou, Yukio Makino, M. Nosé et al. · Thin Solid Films · 1999 · 271 citations

Materials Science, Aluminium Nitride, Thin Film Physics +7

Ion-assisted physical vapor deposition for enhanced film properties on nonflat surfaces

Jones Alami, Per O. Å. Persson, Denis Mušić et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2005 · 237 citations

Ta Thin Film, Engineering, Vacuum Device +19