Publication | Closed Access
Cleaning and passivation of the Si(100) surface by low temperature remote hydrogen plasma treatment for Si epitaxy
46
Citations
22
References
1991
Year
Electrical EngineeringEngineeringSurface ScienceApplied PhysicsSemiconductor Device FabricationSilicon On InsulatorEpitaxial GrowthPlasma EtchingPlasma ProcessingSi Epitaxy
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