Study From Cryogenic to High Temperatures of the High- and Low-Resistance-State Currents of ReRAM Ni–HfO<sub>2</sub>–Si Capacitors

César Vaca, Mireia Bargalló González, Helena Castán, H. García, S. Dueñas, F. Campabadal, E. Miranda, Luis Bailón

IEEE Transactions on Electron Devices · 2016 · 22 citations · 37 references

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Abstract

Resistive switching conduction in Ni/HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Si capacitors is studied at temperatures ranging from 77 to 473 K. A model for the low-resistance state (LRS) consistent with the experimental data is proposed. The LRS current-voltage (I-V) curves show a maximum resistance, R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0</sub> , at zero bias and a minimum value, R <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">∞</sub> , at voltages close to reset, which indicates a departure from linearity. A three-parameter model for the I-V curves is reported and its temperature dependence analyzed.

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